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2 edition of Silicon-Film [TM] photovoltaic manufacturing technology found in the catalog.

Silicon-Film [TM] photovoltaic manufacturing technology

Sandra R. Collins

Silicon-Film [TM] photovoltaic manufacturing technology

final technical status report ; 1 January, 1992 - 31 July 1995.

by Sandra R. Collins

  • 183 Want to read
  • 28 Currently reading

Published by National Renewable Energy Laboratory in Golden, CO .
Written in English


Edition Notes

ContributionsHall, Robert B., Rand, James A., AstroPower, Inc.
The Physical Object
Pagination38 p.
Number of Pages38
ID Numbers
Open LibraryOL17590509M

He was able to sell every last product that he had brought with him. The method for manufacturing a semiconductor device according to claim 7, wherein a thin film transistor is formed in the element layer. In that case, the crystallinity of the oxide semiconductor film can be recovered by performing heat treatment thereon after the addition of the dopant Hydrogenated amorphous silicon may be typically given as an example of an amorphous semiconductor, while polysilicon and the like may be typically given as an example of a crystalline semiconductor. The photocatalyst substance 71 absorbs the light 77, and the photocatalyst substance is activated by the light

Hydrogen needs to be stored under pressure and released on demand. As a substituent, an organic group containing at least hydrogen for example, an alkyl group or aromatic hydrocarbon is used. Logan describe the new approach in a paper titled Electrochemically assisted microbial production of hydrogen from acetate. Such heat treatment for dehydration or dehydrogenation can be performed in the manufacturing process of the transistor a anytime after formation of the oxide semiconductor film before formation of an insulating film including a metal element before addition of oxygen into the oxide semiconductor film Additional electrodeposition was carried out on amorphous carbon film at potential mV SCE for 5s in the same bath for plating Ni-P alloy.

Alternatively, the organic compound layer may be formed first, and then, the photocatalyst substance may be introduced into the organic compound layer after dispersing on the organic compound layer, it may be diffused into the organic compound layer. Nevertheless, he found ways to raise efficiency, such as by setting up tools and utensils more effectively. Through the development and sale of radios, the Sharp brand name gradually became known in Japan. The attached third substrate may be formed from a material which can block light in a wavelength which activates the photocatalyst substance left in the element layer.


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Silicon-Film [TM] photovoltaic manufacturing technology book

In this embodiment, boron is used as the dopantwhose ion is added by an ion implantation method. In other words, by the energy of the activated photocatalyst substance oxidizabilitya carbon-hydrogen bond and a carbon-carbon bond of such organic compound are separated, and a part of the organic compound becomes carbon dioxide and water, and is degassed.

With high efficiency multi junction solar cells requiring a close match spectrum in order to achieve the most accurate calibration and results some research laboratories have been forced to use crude single source instruments for small scale research applications where only a relatively small beam size is required.

The substrate is held in a deposition chamber kept under reduced pressure. Using two liquids enables the device to operate at high altitudes, such as in aircrafts, in polluted environments including the presence of carbon monoxide in atmospheric airas well as underwater. Thin-film solar panels are hard to mass-produce cost-effectively because of the difficulty of coating large areas of glass.

The situation had suddenly grown alarming. Researchers at NREL use porous polycrystalline silicon on low-cost substrates and trap light in the silicon to enable total absorption. Photocatalytic activity can be generated by irradiating the photocatalyst substance with light of an ultraviolet light region having a wavelength of nm or less, preferably, nm or less.

Figure 5.

CN101305465A

In this embodiment, a planarization insulating film While they were thoroughly familiar with metal processing, they had no knowledge of the principles of radio or even electricity.

It is to be noted that laser irradiation may be selectively performed by moving a substrate or may be performed by scanning of the light in the X- and Y-axis directions. The company employed workers and owned 10, m2 of factory sites, along with other buildings covering 3, m2.

Website: www. First, he produced a battery-powered vacuum-tube radio that he named the Sharp Dyne, in emulation of the imported Neutrodyne receiver.

Next, a dopant is selectively added to the oxide semiconductor film through the insulating film including the metal element, the source electrode layer a, and the drain electrode layer b with the gate insulating film and the gate electrode layer as a mask, so that low-resistance regions a and b are formed.

The company designed the ILM-2 as a modular machine concept that can be used as a stand-alone or in-line system, with the option to use different laser sources.

The company supplemented its line-up with a high-end Fuji Go model, which featured an image of majestic Mount Fuji on the cabinet, and an affordably priced model with a simple design.

A back light module comprising: a flexible substrate; and a plurality of light-emitting diodes provided over the flexible substrate, wherein an interval of adjacent two of the plurality of light-emitting diodes is more than twice as large as a thickness of each of the plurality of light-emitting diodes.

These radios required sophisticated technology; even specialized radio equipment manufacturers had put together no more than one or two such sets. Solid A voltage of 0. In addition, after peeling the element layer 73 from the first substrate 70, the insulating layer 90 can be used as a substrate for supporting and sealing the element layer Photovoltaic Industry Roadmap, intended to guide companies in developing solar-energy systems, takes a more prosaic but realistic view of the next three decades.

The oxide semiconductor film has a thickness greater than or equal to 1 nm and less than or equal to nm preferably greater than or equal to 5 nm and less than or equal to 30 nm and can be formed by a sputtering method, a molecular beam epitaxy MBE method, a CVD method, a pulse laser deposition method, an atomic layer deposition ALD method, or the like as appropriate.

Amorphous silicon, the most advanced of the thin-film technologies, has been on the market for about 15 years. Manufacturing Two-Way Radios During the war, the company also manufactured portable two-way radios for the military.

To cope with the shortage of materials, the Osaka Radio Industry Association was created in Aprilwith President Hayakawa as the founder. As for the solid-state laser, it is preferable to use the first to fifth harmonics of the fundamental wave.

Description of the Related Art In recent years, individual recognition technology has attracted attention.

BACKGROUND OF THE INVENTION

In the case where uniform annealing is required from one end to the other end of the linear beam, slits may be provided for the both ends so as to shield a portion where energy is attenuated.

It served as shelter to keep off the night dew. The method for manufacturing a semiconductor device according to claim 4, wherein a liquid crystal display element is included in the element layer. Tokuji had been visiting a friend, but he hurried back to the factory to check on his employees and his family.Silicon Thin Film Photovoltaic (Si-TFPV) activity of CSIR-National Physical Laboratory is one of major laboratory of India for the development of silicon thin film photovoltaic research since many years.

Corrosion of Strap and Lugs of the Negative Plates in VRLA Batteries (English) Corrosion of Strap and Lugs of the Negative Plates in VRLA Batteries Author / Creator: Formation of Abrupt Carrier Profile in Epitaxial Silicon Film by Low Energy Ion Bombardment Process.

Hirayama, M. / Shindo. This paper, which has teaching and public-science aims, presents some examples, attained in the Southern Bays of Galicia (Spain) of inferior and superior mirages, including castles in the air, fata Morganas and atlasbowling.com explanation for the unusual atmospheric refraction is presented, and the different kinds of ray paths distortions that lead to each optical effect and the respective.

As more and more architects and designers gain experience in integrating photovoltaic systems into the built environment, this relatively new technology will begin to blend almost invisibly into the nation’s urban and rural landscapes.

This will happen as BIPV continues to demonstrate a. Dec 13,  · In a manufacturing method of the transistor including the oxide semiconductor film including a channel formation region, an insulating film including a metal element is formed over the oxide semiconductor film, and low-resistance regions in which a dopant added through the insulating film by an implantation method is included are formed in the.

Object of the present invention to provide a peeling method without damaging the release layer having a release layer can be peeled only a small area, and can be peeled off the entire surface of the release layer having a larger area. Further object of the present invention is characterized by the release layer is adhered to a variety of substrates to provide a lightweight semiconductor device Cited by: